Stock & Company Details
ACM Research Inc $ACMR
Price:
46,691,331
61M
$5.8B
52 Week High:
$66.15
10 Day Average Volume:
42,760,466
12.19
50 Day Moving Average:
$156.49
52 Week Low:
$43.74
30 Day Average Volume:
49,506,373
$4.94
2021-02-05
0.95
30 Day Change:
13%
3 Month Change:
-0.32%
Producer Manufacturing
ACMR technical indicators
Latest ACM Research Inc (ACMR) indicator readings as of 2026-08-10.
ACMR's 14-day RSI is 45.6, in neutral territory. At $79.41 it is trading 33.8% above its 200-day moving average of $59.35, and below its 50-day average of $91.25. Price sits in the middle of its Bollinger Bands ($68.00 to $97.66). ADX reads 16.5, indicating a range-bound market rather than a trend.
Select a strategy to see its performance
Backtested on this stock over recent history.
| Strategy | Trend | Return | Win rate |
|---|---|---|---|
| MACD Momentum Momentum Buy when MACD turns positive (crosses above zero) and RSI confirms momentum above 50; sell when MACD falls back below zero. | – | – | |
| RSI Reversal Mean reversion Buy when RSI falls below 30 (oversold), sell when it climbs above 70 (overbought). | – | – | |
| Volatility Breakout Volatility Buy when price closes above the upper Bollinger Band, sell on reversion to the 20-day average. | – | – | |
| Strong-Trend Pullback Trend + timing In strongly trending stocks (ADX above 25), buy short-term dips (Stochastic below 30) and sell into overbought (above 80). | – | – |
Overview
ACM Research Inc is an us-based company. It is engaged in developing, manufacturing, and selling single-wafer wet cleaning equipment, which is used by semiconductor manufacturers in numerous manufacturing steps to remove particles, contaminants, and other random defects to improve product yield, in fabricating integrated circuits, or chips. The company offers space alternated phase shift which employs alternating phases of megasonic waves to deliver megasonic energy to flat and patterned wafer surfaces on a microscopic level; and Timely Energized Bubble Oscillation technology which provides effective, damage-free cleaning for both conventional two and three-dimensional patterned wafers at process nodes.
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